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  • Winners 2009
  • Study of O2, NO and CO reaction processes on silicon surfaces by means of surface differential reflectance and reflectance difference spectroscopy
Dr. Shinya Ohno

Study of O2, NO and CO reaction processes on silicon surfaces by means of surface differential reflectance and reflectance difference spectroscopy

Dr. Shinya Ohno
Research Associate

Yokohama National University

*The organization and the title are those when awarded

Winners 2009
Archive Index
  • Winners 2009Surface Analysis for Semiconductor Related Materials
  • Development and Evaluation of an Innovative “Soft Ionization Technique” based on Atmospheric Pressure Glow Discharges Time-of-flight Mass Spectrometry (AP-GD-TOFMS) for the Determination of Inorganic/organic Contaminants on Semiconductor Surfaces
  • A challenge in ultra-trace analysis by X-ray fluorescence- Instrumentation of novel efficient wavelength-dispersive X-ray spectrometer and the application to TXRF experiments with brilliant synchrotrons
  • Study of O2, NO and CO reaction processes on silicon surfaces by means of surface differential reflectance and reflectance difference spectroscopy
  • The Development of a Portable Total Reflection X-ray Fluorescence Spectrometer with Picogram Sensitivity
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